Intoducing OptoMapper | Stitching Flatness Interferometer System
During the SPIE OPTIFAB Conference in Rochester, New York, InterOptics Managing Director, Dr. Chris Koliopoulos will present a paper describing
the new stitching interferometer system for large plano-optics, titled "Low coherence, high spatial resolution, stitching flatness interferometer system".
OptoMapper, has been developed using an engineered low coherence LED illumination system, where both the spectral and spatial coherence are tailored to allow single surface interference from large plane parallel transparent optical components, without the need to paint the rear surface to suppress interference from that surface. Component applications include large optical flats and windows, glass wafers, photomask substrates, etc. The system incorporates precision stages and a downward looking 6 inch aperture interferometer incorporating a low distortion, high spatial resolution optical design, to measure flatness and mid-spatial frequency waviness over a 14 by 14 inch area, producing stitched maps containing over 100 million data points with 35 micron lateral resolution. Bar mirrors of 600 mm by 100 mm can also be measured offering measurement versatility of larger component sizes.


  4-6 February 2020







